发明名称 NONVOLATILE STORAGE AND ITS FABRICATION PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile storage which attains low power consumption by reducing a current flowing through a memory, and to provide its fabrication process. SOLUTION: A nonvolatile storage comprises a substrate, a first electrode provided on the substrate, a second electrode provided above the first electrode to intersect the first electrode, and a memory provided between the first and second electrodes, wherein at least any one of the surface area of a first memory opposite to the first electrode of the memory or the surface area of a second memory opposite to the second electrode of the memory is smaller than the cross-sectional area of the first and second electrodes opposite to each other because the first and second memories intersect. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009218259(A) 申请公布日期 2009.09.24
申请号 JP20080057470 申请日期 2008.03.07
申请人 TOSHIBA CORP 发明人 FUKUMIZU HIROYUKI;HAYAMIZU NAOYA;TAYA MAKIKO
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
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