| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method in which high-throughput and stable imprint can be performed and a fineness pattern can be obtained. SOLUTION: The imprint method uses an infrared ray light-hardened resin and uses an infrared ray as an exposure light. According to a configuration, using the infrared ray for exposure allows a pattern to be transferred without applying a heating/cooling cycle to a transfer base and an imprint mould. Further, because the need of the heating/cooling cycle is eliminated, the thermal expansion of the transfer base and the imprint mould can be suppressed and the positioning precision of pattern transfer can be improved. Further, because the need of the heating/cooling cycle is eliminated, time required for transfer process can be reduced and the throughput can be improved. COPYRIGHT: (C)2009,JPO&INPIT |
