发明名称 DIPPING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a dipping apparatus capable of suppressing the vaporization of a solvent in a treating solution and properly discharging the vaporized solvent. SOLUTION: The dipping apparatus is provided with a workpiece treating vessel 5 for surface-treating a workpiece W, an opening/closing cover 14 for opening and closing the workpiece treating tank 5, a cover moving mechanism 18 for opening and closing the opening/closing cover 14, an apparatus cover 6 for housing the structural devices, an exhaust duct 25 connected to the apparatus cover 6 at the upstream side and connected to discharge equipment at the downstream side, an exhaust damper 27 for opening and closing the discharge duct 25 and a control means 9 for controlling the cover moving mechanism 18 and the exhaust damper 27. The control means 9 controls to close the exhaust damper 27 to be synchronized with the opening operation of the cover moving mechanism 18 and to open the exhaust damper 27 to be synchronized with the closing operation of the cover moving mechanism 18. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009213995(A) 申请公布日期 2009.09.24
申请号 JP20080059049 申请日期 2008.03.10
申请人 SEIKO EPSON CORP 发明人 ISHII HIROYUKI;SHIRASAKI SUSUMU
分类号 B05C3/02 主分类号 B05C3/02
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