METHOD AND APPARATUS FOR DERIVING AN ISO-DENSE BIAS AND CONTROLLING A FABRICATION PROCESS
摘要
Embodiments of controlling a fabrication process using an iso-dense bias are generally described herein. Other embodiments may be described and claimed.
申请公布号
WO2009060319(A3)
申请公布日期
2009.09.24
申请号
WO2008IB03804
申请日期
2008.10.30
申请人
TOKYO ELECTRON LIMITED;BISCHOFF, JOERG;WEICHERT, HEIKO
