| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive color composition or the like suppressing exposure illuminance dependency, having a high residual film ratio and little development residue and stably forming a pattern of excellent resolution. <P>SOLUTION: The photosensitive color composition contains at least a pigment, a polymerizable monomer, a photopolymerization initiator, and a compound represented by a general formula (I) wherein R<SP>1</SP>and R<SP>2</SP>independently represent a hydrogen atom, a 1-20C alkyl group, a 6-20C aryl group (but are not hydrogen atoms at the same time, R<SP>1</SP>and R<SP>2</SP>may form a cyclic amino group together with a nitrogen atom), and R3 and R4 independently represent an electron-withdrawing group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
