发明名称 SILICON NITRIDE SUBSTRATE, METHOD FOR PRODUCING THE SAME, SILICON NITRIDE CIRCUIT BOARD USING THE SAME, AND SEMICONDUCTOR MODULE
摘要 <P>PROBLEM TO BE SOLVED: To provide a silicon nitride substrate having high strength, and in which warpage is properly regulated, to provide a method for producing the same, to provide a silicon nitride circuit board using the same, and to provide a semiconductor module. <P>SOLUTION: Silicon nitride raw material powder is blended with magnesium oxide of 3 to 4 wt.% and the oxide of at least one kind of rare earth element of 2 to 5 wt.% in such a manner that the total is controlled to 5 to 8 wt.%, so as to be a sheet molded body, and sintering is performed thereto. Thereafter, in a superimposed state, a plurality of the sintered compacts are heated at 1,550 to 1,700&deg;C while applying a load of 0.5 to 6.0 kPa thereto, so as to produce a silicon nitride substrate comprising &beta; type silicon nitride, yttrium (Y) and magnesium (Mg), and in which a variation coefficient showing the distribution of the Mg content in the surface is &le;0.20 and warpage is &le;2.0 &mu;m/mm. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009215142(A) 申请公布日期 2009.09.24
申请号 JP20080063426 申请日期 2008.03.13
申请人 HITACHI METALS LTD 发明人 KAGA YOICHIRO;WATANABE JUNICHI
分类号 C04B35/584;C04B35/64;H01L23/12;H05K1/03 主分类号 C04B35/584
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