发明名称 |
THIN FILM, ITS MANUFACTURING METHOD AND GLASS |
摘要 |
PROBLEM TO BE SOLVED: To provide a thin film retaining water repellency after irradiation with light and additionally having durability and properties of degrading an organic matter. SOLUTION: The thin film contains zirconium oxide or hafnium oxide and crystallized titanium oxide and retains a contact angle to water of 40°or larger on irradiation with light. COPYRIGHT: (C)2009,JPO&INPIT
|
申请公布号 |
JP2009213954(A) |
申请公布日期 |
2009.09.24 |
申请号 |
JP20080057494 |
申请日期 |
2008.03.07 |
申请人 |
UNIV OF TOKYO |
发明人 |
WATABE TOSHIYA;YOSHIDA NAOYA;YOKONISHI RYOSUKE |
分类号 |
B01J35/02;B01J21/06;B01J37/08;C03C17/25 |
主分类号 |
B01J35/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|