发明名称 THIN FILM, ITS MANUFACTURING METHOD AND GLASS
摘要 PROBLEM TO BE SOLVED: To provide a thin film retaining water repellency after irradiation with light and additionally having durability and properties of degrading an organic matter. SOLUTION: The thin film contains zirconium oxide or hafnium oxide and crystallized titanium oxide and retains a contact angle to water of 40°or larger on irradiation with light. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009213954(A) 申请公布日期 2009.09.24
申请号 JP20080057494 申请日期 2008.03.07
申请人 UNIV OF TOKYO 发明人 WATABE TOSHIYA;YOSHIDA NAOYA;YOKONISHI RYOSUKE
分类号 B01J35/02;B01J21/06;B01J37/08;C03C17/25 主分类号 B01J35/02
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