THERMAL ANNEAL OF A BLOCK COPOLYMER FILMS WITH TOP INTERFACE CONSTRAINED TO WET BOTH BLOCKS WITH EQUAL PREFERENCE
摘要
Methods for fabricating sublithographic, nanoscale microstructures utilizing self-assembling block copolymer, and films and devices formed from these methods are provided.
申请公布号
WO2009117243(A1)
申请公布日期
2009.09.24
申请号
WO2009US35861
申请日期
2009.03.03
申请人
MICRON TECHNOLOGY, INC.;MILLWARD, DAN, B.;QUICK, TIMOTHY
