| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide: a reflective mask blank having a substrate, a multilayered reflective film reflecting exposure light, and an absorber absorbing the exposure light, and improved in contrast for inspection light by reducing the film thickness of the absorber and preventing degradation of resolution of a pattern peripheral part in exposure; and a reflective mask. <P>SOLUTION: In this reflective mask blank, the absorber is composed of a first absorber 205 and a second absorber 204, and has a structure where the first absorber 205 is stacked on the second absorber 204 to be set on the exposure light side; the value of an extinction coefficient to the exposure light possessed by the first absorber 205 is larger than or equal to that possessed by the second absorber 204; the value of an extinction coefficient, possessed by the first absorber 205, to the inspection light having a wavelength larger than that of the exposure light is smaller than that possessed by the second absorber 204. This reflective mask is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
