发明名称 Element aus synthetischem geschmolzenem Quarzglas
摘要 There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.
申请公布号 DE60042712(D1) 申请公布日期 2009.09.24
申请号 DE2000642712 申请日期 2000.03.10
申请人 SHIN-ETSU CHEMICAL CO. LTD. 发明人 OTSUKA, HISATOSHI;SHIROTA, KAZUO;KUMAKURA, KAZUHIRO
分类号 C03C3/06;H01L21/027;C03B19/14;C03B20/00;G03F1/14;G03F1/60;H01S3/00;H01S3/225 主分类号 C03C3/06
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