| 摘要 |
<p>PURPOSE: A susceptor for a vapor growth apparatus is provided to arranged a wafer in a right position of the susceptor by preventing the sliding of a silicon wafer. CONSTITUTION: A wafer pocket(101) to arrange a wafer is hollowed inward from the surface and is formed in a susceptor(10) for a vapor growth apparatus. A wafer pocket includes a bottom surface(104), a support surface(102), a side(103), an annular groove(105), and a plurality of gas exhaust hole(106). The bottom surface of the support surface is formed in an outer circumference. The support surface supports the wafer. The side is formed in the outer circumference of the support surface. The side is extend to the susceptor surface. The annular groove is formed in the outermost part of the bottom surface in a line. The annular groove has an incline extended to the bottom surface. A plurality of gas discharge holes pass through the rear side of the susceptor from the annular groove and are extended. The plurality of gas discharge holes has an opening area of 2.0 ~ 3.0 mm^2, and an aperture ratio of 0.25 - 0.5 %.</p> |
