| 摘要 |
PROBLEM TO BE SOLVED: To provide a curable composite for nano-inprint for forming patterns and excellent in mold releasability, etching resistance, and solvent resistance, and a method of forming patterns using the same. SOLUTION: The curable composite for nano-inprint contains a polymerizable monomer (Ax) having a polycyclic aromatic structure and a photopolymerization initiator (B). The method of forming patterns using the same is also disclosed. COPYRIGHT: (C)2009,JPO&INPIT
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