| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device that prevents a step and a projection from being formed when a light shield layer is formed of metal and prevents the deterioration in sensitivity and deficiency in light shielding resulting therefrom. SOLUTION: The solid-state imaging device comprises a substrate 1 which has an imaging region 20 and a light shield region such as a black reference pixel region 30 formed at the periphery thereof, wiring layers 11, 12 and 13 and an interlayer dielectric 4 formed on the substrate 1, and a first light shield layer 15 and a second light shield layer 16 formed of a metal material shielding the light shield region from light. The first light shield layer 15 is formed in the interlayer dielectric 4 adjacently to the imaging region 20 in plan view, and the second light shield layer 16 is formed on the interlayer dielectric 4 adjacently to or partially overlapping with the first light shield layer 15 in plan view. COPYRIGHT: (C)2009,JPO&INPIT
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