| 发明名称 |
IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS |
| 摘要 |
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid. |
| 申请公布号 |
KR20090101306(A) |
申请公布日期 |
2009.09.24 |
| 申请号 |
KR20097016738 |
申请日期 |
2006.02.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;STAVENGA MARCO KOERT;VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS;JANSSEN FRANCISCUS JOHANNES JOSEPH;KUIJPER ANTHONIE |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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