| 摘要 |
<p>PURPOSE: A correcting substrate of a charged particle beam writing apparatus and a writing method are provided to reduce a correcting time of driving the device in comparison with the correction of an error of an irradiation position by writing with the mask blanks. CONSTITUTION: A correcting substrate of a charged particle beam writing apparatus includes a substrate body(12), a first conductive layer(14), and a second conductive layer(16). A low thermal expander is used in the substrate body. The first conductive layer is arranged on the substrate. The second conductive layer is selectively arranged on the first conductive layer. The second conductive layer has the larger reflectivity than the first conductive layer. The lower thermal expander is exposed in the rear side of the correcting substrate.</p> |
