| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad excellent in durability and in stability of polishing characteristic. <P>SOLUTION: In the polishing pad provided with a polishing layer on a substrate layer, the polishing layer comprises a thermosetting polyurethane foam having approximately spherical open cells, and the thermosetting polyurethane foam contains an isocyanate terminal end prepolymer obtained by reacting a prepolymer composition containing an isocyanate component and an active hydrogen group-containing component at a functional group molar ratio (molar number of an isocyanate group of an isocyanate component/molar number of an active hydrogen group of an active hydrogen group-containing component) of 1.5-2 and a chain prolonging agent as material components. <P>COPYRIGHT: (C)2009,JPO&INPIT |
