发明名称 METHOD OF MANUFACTURING WIRING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 There are provided a step of preparing a dummy chip, a step of forming a cavity in a stiffener substrate, a step of providing a second tape base member on one surface of the stiffener substrate, a step of inserting the dummy chip into the cavity to provide the dummy chip on the second tape base member, a step of sealing the stiffener substrate and the dummy chip with a sealing resin, a step of removing the second tape base member and forming a build-up wiring layer on a surface from which the second tape base member is removed, a step of removing the sealing resin; and a step of peeling the dummy chip from the build-up wiring layer.
申请公布号 US2009236031(A1) 申请公布日期 2009.09.24
申请号 US20090409862 申请日期 2009.03.24
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 SUNOHARA MASAHIRO;MURAYAMA KEI;HIGASHI MITSUTOSHI;SAKAGUCHI HIDEAKI
分类号 B32B37/00 主分类号 B32B37/00
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