| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad excellent in durability, hardly generating edge-dropping and making shortening of a dummy polishing time and long life of the pad compatible. <P>SOLUTION: In the polishing pad provided with a polishing layer on a substrate layer, the polishing layer includes a thermosetting polyurethane foam having approximately spherical open cells and is self-adhered to the substrate layer, and thickness is 0.5-1 mm. <P>COPYRIGHT: (C)2009,JPO&INPIT |
