发明名称 NI-P LAYER SYSTEM AND PROCESS FOR ITS PREPARATION
摘要 The invention relates to a layer system comprising on a substrate, the surface of which has been electropolished, (i) a Ni layer having a thickness = 3.0 µm, (ii) a Ni-P layer having a thickness = 1.0 µm, (iii) a Au layer having a thickness = 1.0 µm.
申请公布号 WO2009115192(A2) 申请公布日期 2009.09.24
申请号 WO2009EP01573 申请日期 2009.03.05
申请人 ATOTECH DEUTSCHLAND GMBH;BARTHELMES, JUERGEN;RUETHER, ROBERT;KURTZ, OLAF;DANKER, MICHAEL 发明人 BARTHELMES, JUERGEN;RUETHER, ROBERT;KURTZ, OLAF;DANKER, MICHAEL
分类号 C23C18/44;C25D5/14 主分类号 C23C18/44
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