Membranabdeckung und Haftmittel hierfür

摘要

A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A):fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.