PROCESSING APPARATUS FOR PROCESSING A SUBSTRATE FOR SEMICONDUCTOR AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

An apparatus for processing a substrate for a semiconductor and a liquid crystal display device is provided to prevent corrosion of a chamber due to plasma or a cleaning gas by forming a thermal spraying film in an inner wall of the chamber. A substrate is received in a chamber(11). A bell jar has a spherical surface part formed in a top direction of a cylindrical part. A gas discharge hole(61) supplies a process gas to an inner part of the chamber. A high frequency power source(66) supplies a high frequency power to an antenna. An exhaust pipe(62) is connected to an exhaust device which exhausts an inner part of the chamber. A film including 3a-group element compound having corrosion resistance about a corrosion gas is included.