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发明名称
method for manufacturing a semiconductor device having a dual damascene
摘要
申请公布号
KR100917812(B1)
申请公布日期
2009.09.18
申请号
KR20020087279
申请日期
2002.12.30
申请人
发明人
分类号
H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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