发明名称 Semiconductor Device and Method for Making Same
摘要 One or more embodiments are related to a semiconductor device, comprising: a metallic layer having a top surface and a sidewall surface; an intermediate layer disposed on a sidewall surface of the metallic layer; a dielectric layer disposed over the metallic layer, the dielectric layer having an opening formed therethrough; and a conductive material disposed within the opening, the conductive material at least partially overlying the top surface of the metallic layer, the conductive material being electrically coupled to the metallic layer.
申请公布号 US2009230557(A1) 申请公布日期 2009.09.17
申请号 US20080049405 申请日期 2008.03.17
申请人 INFINEON TECHNOLOGIES AG 发明人 ECKERT STEFAN;LEONHARDT THOMAS;PANTFOERDER JOERG;QUAS LUTZ
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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