发明名称 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
摘要 A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
申请公布号 US2009233232(A1) 申请公布日期 2009.09.17
申请号 US20090468830 申请日期 2009.05.19
申请人 CANON KABUSHIKI KAISHA 发明人 ITO TOSHIKI;YAMAGUCHI TAKAKO
分类号 G03F7/004;C07D311/08 主分类号 G03F7/004
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