NOVEL SALT HAVING FLUORINE-CONTAINING CARBANION STRUCTURE, DERIVATIVE THEREOF, PHOTOACID GENERATOR, RESIST MATERIAL USING THE PHOTOACID GENERATOR, AND PATTERN FORMING METHOD

摘要

Disclosed is an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by general formula (1). By using a photoacid generator for chemically amplified resist materials, which generates the acid, there can be obtained a photoacid generator which is highly sensitive to ArF excimer laser light and the like and generates an acid (photoacid) having sufficiently high acidity. The photoacid generator exhibits high solubility in resist solvents, while having excellent compatibility with resins. A resist material containing the photoacid generator is also disclosed.