METHOD OF FABRICATING A SEMICONDUCTOR DEVICE HAVING A CAPACITOR AND THE SEMICONDUCTOR DEVICE MANUFACTURED THEREBY

摘要

A manufacturing method of a semiconductor device with a capacitor is provided to prevent the leaning of storage node electrodes by forming a supporting patterns. A molding film is formed on a substrate(100). A support pattern(142) which each other is separated is formed on the molding film. A storage node electrode(148a) passing through the molding film is formed. The molding film is removed. A dielectric layer(160) is formed on the storage node electrodes and the support patterns. A plate electrode(162) is formed on the dielectric layer.