PROCESSING APPARATUS FOR PROCESSING A SUBSTRATE FOR SEMICONDUCTOR AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

An apparatus for processing a substrate for a semiconductor and a liquid crystal display device is provided to prevent attachment of a product in a member received inside a chamber by diffusing a process gas having corrosion resistance and insulation property to a surface of a semiconductor wafer. A chamber(11) receives a substrate. A bell jar has a part of a spherical surface formed in a top direction of a cylindrical part. A gas discharge hole(61) supplies a process gas to an inner part of the chamber. An antenna forms an induction field inside the bell jar, and generates plasma of the process gas. A high frequency power source(66) supplies a high frequency power to the antenna. An exhaust pipe(62) is connected to an exhaust device which exhausts the inner part of the chamber.