A method of manufacturing photoelectric device is provided to control the haze of the transparent electrode by controlling the etching time of a transparent conductive film. The first electrode(105) is formed on the substrate(100). The first electrode is partly etched using the etchant(205) including the hydrogen fluoride(HF) for the process time. The concavo-convex pattern is formed in the first electrode surface. The semiconductor layer which causes the photoelectric conversion by the light is formed. The second electrode is formed on the semiconductor layer. The etchant is spread to the first electrode side.
