发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device which is made compact and performs maskless exposure through stable operation and which perform high-precision exposure on a body to be exposed which has a level difference on a surface to be exposed through maskless exposure, and to provide an exposure method. <P>SOLUTION: The exposure device 10 includes a light source 12, an MEMS optical scanner which repeatedly tilts a mirror M, and an exposure optical system which exposes the body to be exposed to light from the light source through the mirror, wherein the exposure device irradiates the body to be exposed with the light from the light source by making a scan through the mirror tilted by the optical scanner, thereby exposing the body to be exposed. An irradiation position on the body to be exposed in a vertical direction to the surface to be exposed is adjusted by a lens barrel actuator. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009212498(A) 申请公布日期 2009.09.17
申请号 JP20090017980 申请日期 2009.01.29
申请人 NSK LTD 发明人 OGUCHI HISAAKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址