发明名称 |
Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
摘要 |
A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
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申请公布号 |
US2009231559(A1) |
申请公布日期 |
2009.09.17 |
申请号 |
US20080218091 |
申请日期 |
2008.07.11 |
申请人 |
HOLMES RUSSELL J |
发明人 |
HOLMES RUSSELL J. |
分类号 |
G03B27/52;G02B27/00;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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