发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning electron microscope can accurately measure a sample potential or a sample height, while preventing damages and the like by a charged-particle radiation. SOLUTION: In order to solve the subject matter, the scanning electron microscope is provided to measure the sample height and the sample potential using measured results obtained at the applied state of a voltage to a sample, so as not to get the charged-particle radiation of an electronic beam to the sample when it is radiated to the sample. Further as one embodiment, the scanning electron microscope includes a function to correct conditions and the like in an apparatus such as magnification, focus, measuring coordinate and the like varied in accordance with a sample electrification, based on the measured sample height and the sample electrification. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009211961(A) 申请公布日期 2009.09.17
申请号 JP20080054227 申请日期 2008.03.05
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IKEGAMI AKIRA;YAMAZAKI MINORU;YANO MANABU;ASAO KAZUNARI;KAZUMI HIDEYUKI;MIZUNO TAKESHI;KOJIMA TAKEKI
分类号 H01J37/29;G01B15/00;H01J37/244 主分类号 H01J37/29
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