| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide suitable technique for obtaining a high throughput while securing requested overlap precision. <P>SOLUTION: An exposure apparatus comprises a grouping unit 103 which groups a plurality of substrates according to characteristics thereof and determines a reference substrate and a non-reference substrate, a measurement unit 104 which takes measurements at a first number of measurement points of the reference substrate and also takes measurements at a second number of measurement points of the non-reference substrate, a correction value determination unit 105 which determines a first correction value for positioning the reference substrate and a second correction value for positioning the non-reference substrate, and an exposure unit 107 which positions the substrates based on the first correction value and second correction value and exposes them. The correction value determination unit 105 determines the first correction value based on measurement results of the reference substrate obtained by the measurement unit 104 and determines the second correction value based on measurement results of the non-reference substrate obtained by the measurement unit 104 and the measurement results of the reference substrates obtained by the measurement unit 104 or the first correction value. <P>COPYRIGHT: (C)2009,JPO&INPIT |
