发明名称 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF
摘要 A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
申请公布号 US2009233243(A1) 申请公布日期 2009.09.17
申请号 US20090472585 申请日期 2009.05.27
申请人 KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO 发明人 KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO
分类号 G03F7/20;B41C1/10;B41N1/00;G03F7/00;G03F7/004;G03F7/075 主分类号 G03F7/20
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