EVALUATION METHOD AND RADIATION-SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an evaluation method of a resin for evaluating a degree of occurrence of development defects at the stage of a resin material, and to provide a radiation-sensitive resin composition suitably usable as a chemically amplified resist.

SOLUTION: The evaluation method is characterized by evaluating a degree of occurrence of development defects in a radiation-sensitive resin composition according to the following steps (1) to (4): (1) forming a film of the radiation-sensitive resin composition as an object to be evaluated on a substrate; (2) baking the film after exposure; (3) dissolving the film baked after exposure in a developer to prepare a developer solution of a predetermined concentration; and (4) measuring hydrodynamic radius in the developer solution by dynamic light scattering method.

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