| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method achieving high precision and high throughput without burdening users and reducing transfer errors caused by pattern variations, in an exposure apparatus. <P>SOLUTION: The exposure apparatus includes: an input section in which there are input positions of a plurality of marks formed on an original or an original reference plate, exposure regions in the original, and adjustment items related to the transfer errors; a selection section for selecting marks to be used for measurement from the plurality of marks based on position information of the plurality of marks, position information of the exposure regions and the adjustment items; a measurement section measuring the marks to be used for measurement and the substrate reference marks; and an adjustment section carrying out at least one of driving an original stage, driving a substrate stage, driving a lens of a projection optical system, and changing a wavelength of a light source, so as to reduce displacement of the marks to be used for measurement and the substrate reference marks based on measurement results by the measurement section. <P>COPYRIGHT: (C)2009,JPO&INPIT |
