发明名称 CHEMICAL VAPOR DEPOSITION REACTOR
摘要 PROBLEM TO BE SOLVED: To provide a reactor easily and economically expandable to increase a throughput without substantially receiving influence of undesirable effects of heat convection. SOLUTION: A chemical vapor deposition reactor is equipped with a plurality of chambers (951, 952, 953) and at least one of a common reaction gas supply system (960) and a common gas exhausting system (970). COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009212531(A) 申请公布日期 2009.09.17
申请号 JP20090144159 申请日期 2009.06.17
申请人 BRIDGELUX INC 发明人 LIU HENG
分类号 H01L21/205;C23C16/44;C23C16/455;C23C16/458;C30B25/14;C30B29/40 主分类号 H01L21/205
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