| 摘要 |
PROBLEM TO BE SOLVED: To promote removal of an organic metal liquid raw material from a liquid raw material flow path of a vaporizer, and to suppress clogging in the liquid raw material flow path. SOLUTION: A method of manufacturing a semiconductor includes a step of carrying a substrate in a processing chamber; a step of processing the substrate by supplying several times a plural kinds of reaction substances in the processing chamber; and a step of carrying the substrate after the processing out the processing chamber, wherein at least one of the plural kinds of reaction substances contains a raw material gas vaporized from a liquid raw material in the vaporizer; and in the step of processing the substrate, the vaporization operation is intermittently carried out to supply and vaporize the liquid raw material to a vaporization section, and at least during the time other than the vaporization operation time for the liquid raw material, a solvent which can dissolve the liquid raw material is made to flow at a first flow amount to the vaporization section; and during the time other than the vaporization operation time for the liquid raw material and each time the vaporization operation for the liquid raw material is carried out in the predetermined number of times, the solvent is made to flow to the vaporization section, at a second flow amount which is larger than the first flow amount. COPYRIGHT: (C)2009,JPO&INPIT
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