发明名称 Mask Making Decision for Manufacturing (DFM) on Mask Quality Control
摘要 The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.
申请公布号 US2009232384(A1) 申请公布日期 2009.09.17
申请号 US20080048043 申请日期 2008.03.13
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 TU CHIH-CHIANG;HUANG CHIEN-CHAO
分类号 G06K9/00 主分类号 G06K9/00
代理机构 代理人
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