发明名称 ULTRAVIOLET IRRADIATION APPARATUS AND ULTRAVIOLET IRRADIATION METHOD
摘要 An object to be irradiated with ultraviolet is a semiconductor wafer (W) whereupon a protection sheet (S) is attached through an ultraviolet curing adhesive layer (18). An ultraviolet irradiation section (12), which has a plurality of ultraviolet light emitting diodes (21) on a substrate (20), is arranged at a position facing the wafer. The light emitting diodes (21) are arranged at substantially the same intervals along a direction that substantially orthogonally intersects with a relative shift direction to the wafer (W). While the light emitting diodes (21) on each low have substantially the same peak wavelength, the peak wavelengths of the adjacent light emitting diodes (21) are not necessarily the same.
申请公布号 KR20090098793(A) 申请公布日期 2009.09.17
申请号 KR20097009487 申请日期 2007.10.29
申请人 LINTEC CORPORATION 发明人 KAWASAKI KIMIHIKO;AOKI YOTA
分类号 H01L21/78;H01L21/301;H01L33/00;H01L33/48 主分类号 H01L21/78
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