| 摘要 |
A substrate cleaning apparatus, a substrate cleaning method, and a memory media are provided to clean a cleaning member at a short time by cleaning a brush part through rotation of the cleaning member and a brush cleaning body. A substrate is horizontally rotated by a rotation maintenance unit. While a cleaning solution is supplied to a rear surface of the substrate, the rear surface of the substrate is cleaned by contacting a brush part(5) of a cleaning member(50). A glass substrate(6) is installed in an under cup(43) of a box shape in which a top surface is opened. A moving unit moves the cleaning member between a region for cleaning the substrate and a region in which the brush part is cleaned. A cleaning solution supply unit supplies the cleaning solution between a bottom surface of the brush cleaning body and the brush part. The number of rotations of the brush part is more than 200rpm.
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