发明名称 |
PHOTOCATALYTIC FILM, ITS MANUFACTURING METHOD, ARTICLE, AND HYDROPHILIZATION METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a new photocatalytic film which exhibits photo-excited superhydrophilicity under sunlight irradiation, but suppresses the decomposition activity of an organic matter. <P>SOLUTION: In the photocatalytic film, at least one of main surfaces contains photosemiconductor particles, and is hydrophilized by light irradiation. When the main surface is irradiated with light having a half-value width of 15 nm or less after retention in the dark, a hydrophilization rate is less than 2 (1/deg/min/10<SP>5</SP>) in a region of wavelength of irradiation light of 370 nm or more, and is 2 (1/deg/min/10<SP>5</SP>) or more in at least a part of a region where the irradiated light has a wavelength of 300-360 nm. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009208062(A) |
申请公布日期 |
2009.09.17 |
申请号 |
JP20080178845 |
申请日期 |
2008.07.09 |
申请人 |
UBE NITTO KASEI CO LTD |
发明人 |
TANAKA NAOKI;KITAGAWA TAKESHI;SUEMATSU DAISUKE;TAKAMI KAZUYUKI |
分类号 |
B01J35/02;B01J37/08;C09D1/00;C09D5/00;C09D7/12;C09D185/00;C09D201/00 |
主分类号 |
B01J35/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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