发明名称 ELECTRON BEAM DRAWING DEVICE AND ELECTRON BEAM DRAWING METHOD
摘要 PROBLEM TO BE SOLVED: To draw a precise pattern on a substrate surface. SOLUTION: A drawing clock signal Bclk for determining timing of blanking an electron beam is generated based on a time calculated based on distances from a reference position to a drawing start position of starting the drawing of the pattern and a drawing finish position, and a speed of an irradiation position (or incident position) of the electron beam moving along a spiral track STr, when forming the pattern along the spiral track STr. The electron beam is thereby blanked in an interval from the drawing finish position of the pattern to the drawing start position of the next pattern, based on the drawing clock signal Bclk, and the patterns are drawn sequentially along the spiral track STr. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009210666(A) 申请公布日期 2009.09.17
申请号 JP20080051497 申请日期 2008.03.03
申请人 RICOH CO LTD 发明人 WATABE TOSHIO;FUJIWARA YASUHIDE;KAMATA TERUMI;HASHIGUCHI TSUYOSHI
分类号 G03F7/20;H01J37/305;H01L21/027 主分类号 G03F7/20
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