| 发明名称 |
SUBSTRATE, METHOD AND APPARATUS OF TREATING SUBSTRATE, SUBSTRATE TREATMENT SYSTEM, METHOD AND APPARATUS OF LITHOGRAPHY, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate capable of inhibiting occurrence of lithography failures. <P>SOLUTION: The substrate to be exposed by exposure light via a liquid includes a substratum and a HMDS film formed only at the edge of the substratum. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009212132(A) |
申请公布日期 |
2009.09.17 |
| 申请号 |
JP20080050780 |
申请日期 |
2008.02.29 |
| 申请人 |
NIKON CORP |
发明人 |
MIYAZAWA TAMI;TANIGAWA SHUNSUKE;SAITO SHINJIRO;HAYASHI TSUNEHITO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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