| 摘要 |
PROBLEM TO BE SOLVED: To provide a charge eraser which removes charge on the surface and inside of a wafer quickly in an inexpensive manner and a method of erasing charge using the eraser. SOLUTION: The charge eraser comprises a first ionizer 101 disposed above the wafer 4, a second ionizer 102 disposed below the wafer, a heat plate 105 which does not interfere with an area 102d where ions are sprayed, and an insulating support pin 103 for positioning the wafer 4 on the heat plate 105. When a passivation film 3 on the upper surface of the wafer carries a negative charge, after heating the wafer and applying a negative charge to the lower surface of the wafer with the second ionizer to charge it, the negative charge inside the passivation film is attracted to the upper surface of the wafer and erased by spraying a positive charge with the first ionizer and then the charge on the lower surface is erased by spraying a positive charge with the second ionizer. COPYRIGHT: (C)2009,JPO&INPIT |
