发明名称 SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a scanning electron microscope which is suitable for monitoring conditions of the device, without having to depend on the existence of electrostatic charges or sample tilting, or the like. SOLUTION: In order to solve the problems, the scanning electron microscope is proposed that is equipped with a function in which device conditions are monitored based on information obtained in a state that electron beam does not reach a sample. As a more concrete example, by impressing a negative voltage on the sample, the electron beam is made to have a state that it is reflected without reaching the sample, and changes in detecting positions of the reflected electrons obtained, when prescribed signals are supplied to a deflector for alignment is monitored. If a prescribed signal represents the state that alignment is appropriately carried out, the changes in the detected positions of the electrons are determined as reflecting misalignment of axis. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009211962(A) 申请公布日期 2009.09.17
申请号 JP20080054229 申请日期 2008.03.05
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YAMAZAKI MINORU;IKEGAMI AKIRA;KAZUMI HIDEYUKI;YANO MANABU;ASAO KAZUNARI
分类号 H01J37/28;H01J37/04;H01J37/244;H01J37/29 主分类号 H01J37/28
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