发明名称 RESISTANCE CHANGE TYPE MEMORY AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To suppress a forming voltage while maintaining a resistance change material film at a film thickness capable of securing the reliability of operation, in a miniaturized resistance changing element. SOLUTION: A resistance change type memory is composed of the resistance changing element including a resistance changing layer sandwiched between a pair of electrodes. The resistance changing layer includes a lamination of a polycrystalline oxide film and an amorphous oxide film thicker than the polycrystalline oxide film. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009212380(A) 申请公布日期 2009.09.17
申请号 JP20080055270 申请日期 2008.03.05
申请人 FUJITSU LTD 发明人 TSUNODA KOJI
分类号 H01L27/10;H01L45/00 主分类号 H01L27/10
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