发明名称 Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System
摘要 Provided are a magnet structure and the like capable of changing a magnetic force line distribution on a surface of a target to thereby achieve wide erosion of a target, using a simple drive mechanism. A magnet structure (110) comprises a main magnet (10, 13) disposed at a reverse surface (20B) side of a target (20) to produce a main magnetic force line reaching an obverse surface (20A) of the target, an adjustment magnet (11) disposed at the reverse surface (20B) side of the target (20) to produce an adjustment magnetic force line for changing a magnetic flux density distribution produced by the main magnetic force line, a magnetic path (21A, 21B, 24) of the adjustment magnetic force line which is disposed at the reverse surface (20B) side of the target 20, and a magnetic field adjustment means (12, 14) configured to be able to change strength of the adjustment magnetic force line passing through inside of the magnetic path (21A, 21B, 24).
申请公布号 US2009229977(A1) 申请公布日期 2009.09.17
申请号 US20060090465 申请日期 2006.11.02
申请人 SHINMAYWA INDUSTRIES, LTD. 发明人 KONDO TAKAHIKO;HORI TAKANOBU;IWASAKI YASUKUNI;YONEYAMA NOBUO
分类号 C23C14/35 主分类号 C23C14/35
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