| 摘要 |
<p>A sulfonate-containing polymer compound, a resist material using the compound, and a method for forming a pattern by using the resist material are provided to improve resolution and to reduce line edge roughness when applied to a base resin of a radiation sensitive resist material. A sulfonate-containing polymer compound comprises the repeating unit of sulfonate represented by the formula 1, wherein R^1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R^2-R^4 are independently a C1-C10 linear, branched or cyclic alkyl or alkoxy group; R^5 is a C1-C30 substituted or unsubstituted linear, branched or cyclic alkyl group, or a C6-C14 substituted or unsubstituted aryl group; and k, m, and n are independently 0-3.</p> |
