Photothermographic material, its processing method, and mask material,申请号EP20020005234-传众专利搜索

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法人/股东/高管

发明名称	Photothermographic material, its processing method, and mask material
摘要
申请公布号	EP1243967(B1)	申请公布日期	2009.09.16
申请号	EP20020005234	申请日期	2002.03.08
申请人	KONICA CORPORATION	发明人	SAMPEI, TAKESHI
分类号	G03C1/498	主分类号	G03C1/498
代理机构		代理人
主权项
地址

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