APPARATUS FOR TREATING SUBSTRATE AND METHOD THEREOF

摘要

An apparatus and a method for processing a substrate are provided to remove a processing solution coated on an upper surface of the substrate uniformly by preventing the processing solution from remaining non-uniformly in the center of the substrate. A first horizontal transfer unit(110) transfers a substrate horizontally. An upward curved transfer unit(210) transfers the substrate transferred from the first horizontal transfer unit to the upside. A downward curved transfer unit(220) transfers the substrate transferred from the upward curved transfer unit to the down side. A second horizontal transfer unit(120) horizontally transfers the substrate transferred from the downward curved transfer unit. A plurality of first circular rollers(310) operate the first horizontal transfer unit and the second horizontal transfer unit. A plurality of second circular rollers(320) operate the upward curved transfer unit and the downward curved transfer unit.